Atomic Layer Deposition on Particles?
It's Possible Now ... at Production Scale
More importantly, we can design customized thin films coatings at ALD NanoSolutions. With our long history of pioneering ALD and MLD on particles and polymers, we can coat almost any substrate for your application needs.
Particle ALD and Polymer ALD processing can be performed at commercial scales to create cost effective coating solutions. Both large batch and continuous ALD coating methods are available to help you transition from R&D to production, assisted by our diverse team of experts. Take comfort in our 10+ years of profitable operation and experienced executive team.
ALD NanoSolutions (ALDN) and the University of Colorado are granted European Patent Covering Atomic Layer Deposition onto Polymers
Boulder, CO – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Polymer ALD™ technology to develop novel barrier films has exclusively licensed technology from the University of Colorado. The newly issued European patent expands the proprietary technology to create ultra-thin flexible ultrabarriers and other important surface functionalization on polymers. The newly issued patent is European Patent 1425110 “A Method of Depositing an Inorganic Film on an Organic Polymer”. The innovation will enable a number of compelling applications including unique formulations for optically clear, flexible, water and oxygen ultrabarrier films and other protective films onto polymers. The films can be developed for a wide variety of polymers to meet the […]
ALD NanoSolutions, Inc. has announced the award of a $150,000 Phase I Small Business Innovation and Research (SBIR) grant from the Department of Energy for “Enhanced Capacitive Deionization using Carbon Electrodes Conformally Coated with Metal Oxides by Atomic Layer Deposition”. The award, effective June 9, 2014 – March 8, 2015, will be used to develop a cost and energy effective method for water desalination. The research, done in partnership with the University of Colorado at Boulder, represents another promising application of ALD coatings for improving energy efficiency. The increasing global need for clean water has spurred the development of multiple desalination techniques, which have traditionally been cost and energy intensive. […]
ALD NanoSolutions is represented at TechConnect World 2014 this year with two oral presentations and two poster presentations. Dr. Karen Buechler will be discussing “Atomic Layer Deposition Innovations in Li-Ion Battery Technology” during the Advanced Batteries session on Tuesday, June 17th at 4:40 ET. This is followed by “Improved Catalysts Prepared using Atomic Layer Deposition Techniques” during the Nanomaterials for Catalysis III session on June 18th at 11:35 ET. The poster presentations are in Advanced Manufacturing on June 16th at 4:30 ET featuring “ALD Tools for Thin-Film Coated Particle Development and Production” and at the Sustainable Nanomanufacturing session on June 16th at 4:30 ET featuring “Roll-to-Roll (R2R) ALD Thin Film […]
Broomfield, CO – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Particle ALD™ technology to develop novel nanocoated particles, has received notice of a newly issued atomic layer deposition (ALD) patent from the US PTO. The broad-based patent, developed in collaboration with University of Colorado (Boulder), expands the ALDN proprietary IP portfolio to include protective coatings placed directly on water and oxygen-sensitive phosphor particles used in LED lighting. The newly issued patent is US patent number 8,637,156 “Methods for Producing Coated Phosphors and Host Material Particles Using Atomic Layer Deposition Methods”. This patent covers both the process and the materials produced by using Particle ALD™ methods to protect phosphor […]