U.S. Naval Research Laboratory investigates particle ALD using ALD NanoSolutions rotary reator

Washington D.C. (March 1, 2016) – Boris Feigelson’s group from the U.S. Naval Research Laboratories have just published a new article in the Journal of Vacuum Science & Technology A, Growth per cycle of alumina atomic layer deposition on nano- and micro-powders, concerning alumina growth rate on particles using ALD NanoSolutions’ RX rotary reactor.  The paper investigates the growth rate of ALD alumina on particles and shows similar results to past work with a growth rate per cycle of 0.15 – 0.20 nm/cycle at 150 °C. In addition, they investigated a range of nanometer-scale particle sizes to determine if particle size has any effect on growth rate. They report that the ALD coating thickness is uniform across all particles within each particle size range, illustrating the mixing effectiveness of the RX rotary reactor for nanoscale powders. DOI: http://dx.doi.org/10.1116/1.4941918

Update (April 20, 2016) – Press Release from U.S. Naval Research Laboratories: NRL Reveals Novel Uniform Coating Process of p-ALD

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