Atomic Layer Deposition on Particles?
It's Possible Now ... at Production Scale
At ALD NanoSolutions, we can design customized thin films coatings for range of applications. With our long history of pioneering ALD and MLD on particles and polymers, we can coat almost any substrate for your application needs.
Particle ALD and Polymer ALD processing can be performed at commercial scales to create cost effective coating solutions. Both large batch and continuous ALD coating methods are available to help you transition from R&D to production, assisted by our diverse team of experts. Take comfort in our 10+ years of profitable operation and experienced executive team.
June 5, 2011 ALD NanoSolutions, Inc. has announced the award of a $749,000 Phase II Small Business Innovation Research (SBIR) grant from the Defense Advanced Research Projects Agency for “Flexible Gas Diffusion Barriers Using ALD/MLD Multilayers and Roll-to-Roll Processing.” The award, effective June 9, 2011 – June 8, 2013, will be used to develop flexible […]
May 23, 2011 ALD NanoSolutions, Inc. has announced the award of a $150,000 Phase I Small Business Innovation and Research (SBIR) grant from the Department of Energy for “Extended Lifetime Supported Nanocatalysts for Energy Improvements in Commodity Chemical Manufacturing.” The award, effective June 17, 2011 – March 17, 2012, will be used to develop a […]
August 10, 2010 ALD NanoSolutions, Inc. (ALDN) announced the receipt of Canadian Patent 2,452,531, “Insulating and Functionalizing Fine Metal Particles with Conformal Ultrathin Films,” a broad composition of matter patent for practicing Atomic Layer Deposition (ALD), or Particle ALD™. The company’s proprietary technology is based on non-agglomerated fine and ultrafine particles having inorganic ultrathin films […]
June 14th, 2010, Helsinki (FI) and Boulder (CO, US) Beneq, leading provider of new industrial equipment and technology based on atomic layer deposition (ALD) equipment, and ALD NanoSolutions, renowned developer of ALD processes and applications, including proprietary Particle ALD™ and Polymer ALD™, have today signed a letter of intent (LOI) for future collaboration. The collaboration […]