Atomic Layer Deposition on Particles?
It's Possible Now ... at Production Scale
At ALD NanoSolutions, we can design customized thin films coatings for range of applications. With our long history of pioneering ALD and MLD on particles and polymers, we can coat almost any substrate for your application needs.
Particle ALD and Polymer ALD processing can be performed at commercial scales to create cost effective coating solutions. Both large batch and continuous ALD coating methods are available to help you transition from R&D to production, assisted by our diverse team of experts. Take comfort in our 10+ years of profitable operation and experienced executive team.
DENVER, COLORADO — (Jun. 14, 2014) – ALD NanoSolutions is represented at TechConnect World 2014 this year with two oral presentations and two poster presentations. Dr. Karen Buechler will be discussing “Atomic Layer Deposition Innovations in Li-Ion Battery Technology” during the Advanced Batteries session on Tuesday, June 17th at 4:40 ET. This is followed by “Improved Catalysts Prepared using Atomic Layer Deposition Techniques” during the Nanomaterials for Catalysis III session on June 18th at 11:35 ET. The poster presentations are in Advanced Manufacturing on June 16th at 4:30 ET featuring “ALD Tools for Thin-Film Coated Particle Development and Production” and at the Sustainable Nanomanufacturing session on June 16th at 4:30 ET featuring “Roll-to-Roll […]
DENVER, COLORADO — (Jan. 28, 2014) – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Particle ALD™ technology to develop novel nanocoated particles, has received notice of a newly issued atomic layer deposition (ALD) patent from the US PTO. The broad-based patent, developed in collaboration with University of Colorado (Boulder), expands the ALDN proprietary IP portfolio to include protective coatings placed directly on water and oxygen-sensitive phosphor particles used in LED lighting. The newly issued patent is US patent number 8,637,156 “Methods for Producing Coated Phosphors and Host Material Particles Using Atomic Layer Deposition Methods”. This patent covers both the process and the materials produced by using Particle ALD™ methods to protect […]
ALD NanoSolutions’ Founder Prof. Steven George Honored with 2013 ALD Innovation Award by the American Vacuum Society
DENVER, COLORADO — (Jul. 29, 2013) – ALD NanoSolutions is pleased to announce that the American Vacuum Society has awarded Professor and Co-Founder Steven George the 2013 ALD Innovation Award at the annual topical conference on Atomic Layer Deposition (ALD). This award is given to an individual who has made significant achievements in the field of ALD. Dr. George is an innovator who has been on the cutting edge of transitioning the fundamentals of atomic layer deposition to commercial applications for more than 10 years. He currently works in diverse areas including electric power storage and generation as well as transparent flexible ultra-barrier films. About ALD NanoSolutions ALD NanoSolutions (ALDN) is dedicated to […]
DENVER, COLORADO — (May 2, 2013) – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Polymer ALD™ technology to develop novel barrier films, has exclusively licensed recently-developed atomic layer deposition (ALD) and molecular layer deposition (MLD) technology from the University of Colorado (Boulder). The newly issued Japanese patent expands the ALDN proprietary IP portfolio to include ultra-thin flexible ultrabarriers created by an ALD/MLD process. These flexible multilayer barrier solutions have been referenced in multiple FOLED market studies as being critical for the implementation of flexible OLED displays. The newly issued patent is Japanese Patent Number 5220106 “Protective Coatings for Organic Electronic Devices Made Using Atomic Layer Deposition and Molecular Layer Deposit […]