Denver, CO – ALD NanoSolutions is proud to announce that our article in JVST-A was one of the most read ALD articles from 2014. The article, Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness, featuring our senior scientist, Dr. Markus Groner, with graduate student Alex Yersak and Professor Y.C. Lee from the University of Colorado – Boulder, discusses the in situ analysis of ALD growth on the first atmospheric pressure spatial ALD web coating reactor. It demonstrates ALD NanoSolutions’ commitment to innovation in roll to roll ALD and process control. Using reflectometry, ALD NanoSolutions and CU-Boulder were able to monitor thin film growth of an alumina ALD film on a polymer web moving at 1-2 m/s, achieving ALD cycle times of less than 0.1 s.
- Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness
About ALD NanoSolutions, Inc.
At ALD NanoSolutions, we bring the future of nanotechnology to the present. From new forms of lighting to advanced lithium-ion batteries, we are working with Fortune 100 companies to vastly improve their current products in an economically and environmentally sustainable way. We currently offer a large portfolio of technical expertise including tolling runs, licensing and equipment. Our mission is to accelerate the commercial success of a wide range industries by delivering our superior material solutions based on our proprietary nanocoating platform. Further information about ALD NanoSolutions is available at www.aldnanosolutions.com.
For more information call ALD NanoSolutions at (303) 318-4145 or e-mail email@example.com