ALD NanoSolutions offers a number of passivation solutions through its films. Particles, polymers, and objects can all be protected with films as thin as physically possible. A wide range of protections are offered including UV blocking, electrical insulation, and anti-oxidation. Protection effects can be observed with films as thin as 1nm and can be tuned to exact performance requirements with excellent reproducibility due to self-limiting deposition.
Passivation using SiO2
Silicon dioxide ALD thin films provide superior protection over any other thin film process. When 250 nm pigment grade TiO2 is coated with 2 nm of SiO2 it provides high quality protection against high temperatures and conc. H2SO4 when compared to an uncoated particle.
Cost competitive solutions:
Powders: $0.1-10/kg (surface area/thickness dependant)
MEMS/NEMS Devices: ¢ to $ per device.