Atomic Layer Deposition on Particles?

It's Possible Now ... at Production Scale

At ALD NanoSolutions, we can design customized thin films coatings for range of applications. With our long history of pioneering ALD and MLD on particles and polymers, we can coat almost any substrate for your application needs.

Particle ALD and Polymer ALD processing can be performed at commercial scales to create cost effective coating solutions. Both large batch and continuous ALD coating methods are available to help you transition from R&D to production, assisted by our diverse team of experts. Take comfort in our 10+ years of profitable operation and experienced executive team.

Coating Services

Have some particles, polymer, or object that needs the world's best coating? We can help.

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Custom Solutions

Customized coatings that enable your substrate to meet your application needs.

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Is Particle ALD development on your horizon? Check out our flexible reactor designs.

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Recent News

ALD NanoSolutions to discuss spatial atomic layer deposition on powders at TechConnect 2016

Washington, D.C. — (May 16, 2016) – ALD NanoSolutions (ALDN) is represented at TechConnect World 2016 this year with one oral presentation. Dr. Karen Buechler will be discussing “Atmospheric Pressure Spatial ALD onto Powders with Conventional Powder Handling Equipment” during the Engineering Nanoparticles to Optimize Application Specific Performance session on Tuesday May 24th at 11:10AM ET. Please come listen to this innovative method for large scale production of ALD coated powders. Dr. Buechler will be attending all three days of the TechConnect World conference and looks forward to discussing how ALDN can help serve your needs. At ALD NanoSolutions, we bring the future of nanotechnology to the present. From new […]

U.S. Naval Research Laboratory investigates particle ALD using ALD NanoSolutions rotary reator

Washington D.C. (March 1, 2016) – Boris Feigelson’s group from the U.S. Naval Research Laboratories have just published a new article in the Journal of Vacuum Science & Technology A, Growth per cycle of alumina atomic layer deposition on nano- and micro-powders, concerning alumina growth rate on particles using ALD NanoSolutions’ RX rotary reactor.  The paper investigates the growth rate of ALD alumina on particles and shows similar results to past work with a growth rate per cycle of 0.15 – 0.20 nm/cycle at 150 °C. In addition, they investigated a range of nanometer-scale particle sizes to determine if particle size has any effect on growth rate. They report that the […]

ALD NanoSolutions and the University of Colorado awarded a US Patent for Deposition of Thin Films onto Li-Ion Battery Electrodes

DENVER, CO (Nov. 24, 2015) – Extending its proprietary Particle ALDTM and Polymer ALD™ technology platform, ALD NanoSolutions (ALDN) has exclusively licensed technology from the University of Colorado to develop novel  battery  electrode coatings.  The newly issued US Patent Number 9,196,901 “Lithium Battery Electrodes with Ultra-Thin Alumina Coatings” covers a process to create proprietary films which provide critical physical and chemical properties for extending the lifetime of lithium ion batteries. Using atomic layer deposition, the innovation allows for alumina coatings to penetrate into the electrode and conformally coat the active electrode particles. This precision surface coating builds physical strength as well as providing chemical protection in the lithium battery electrodes […]

ALD NanoSolutions journal article one of most read in 2014.

Denver, CO – ALD NanoSolutions is proud to announce that our article in JVST-A was one of the most read ALD articles from 2014. The article, Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness, featuring our senior scientist, Dr. Markus Groner, with graduate student Alex Yersak and Professor Y.C. Lee from the University of Colorado – Boulder, discusses the in situ analysis of ALD growth on the first atmospheric pressure spatial ALD web coating reactor. It demonstrates ALD NanoSolutions’ commitment to innovation in roll to roll ALD and process control. Using reflectometry, ALD NanoSolutions and CU-Boulder were able to monitor thin film growth […]