The ALD Process

The Concept

Atomic layer deposition is a gas phase two reaction process. It can be easily explained using bricks as an analogy. Imagine you have red and blue bricks, but there are some rules. Red bricks can only stack on blue, and blue bricks only stack on red. We put down a layer of blue bricks, then a layer of red, and call this one ALD cycle. These cycles are usually around 1 Angstrom, or 0.0000000001 meters thick. We then repeat these stacks until we get a desired film thickness. The surface would look like this:

ALD A-B Image

One cycle of Atomic Layer Deposition

The Chemistry

To get more technical, replace the red and blue bricks with molecules. For aluminum oxide, our most popular and versatile chemistry, our red bricks are aluminum containing molecules. The blue bricks are oxygen containing molecules, water molecules. When we bring in our aluminum molecules, it reacts to leave aluminum atoms on the surface. Since it can’t react with itself, it only deposits one layer of aluminum atoms on the surface and stops. Then we bring in our oxygen containing molecules and they put down a layer of oxygen. That completes one cycle and now the surface looks like this:

For more information on the fundamentals of ALD and MLD, please visit our founder, Steve George’s website.


ALD NanoSolutions (ALDN) is Granted US Patent For Nanocoatings on Phosphor Particles

January 28, 2014 – Full press release

Founder Prof. Steven George Honored with 2013 ALD Innovation Award

July 29, 2013 - Full press release

ALD NanoSolutions (ALDN) is granted Japanese Patent Covering Protective Coatings for OLEDs

May 2, 2013 - Full press release

ALD NanoSolutions (ALDN) granted
Patent Covering Catalytic Energy
Production Application of Particle ALD™

May 29, 2012 – Full press release

ALD NanoSolutions, Inc. CEO Receives 2012 University of Colorado Distinguished Engineering Alumni Award

April 27, 2012 - Full press release

Naval Air Warfare Center, Weapons Division
Selects ALD NanoSolutions Particle ALD™ System

November 28, 2011 – Full press release