Surface Modification
Atomic layer deposition has the ability to modify surfaces with the minimal thickness required. Only a few atomic layers is required to provide a more lubricious, wettable or compatible surface. The ALD process can be a very cost effective way to maintain the bulk properties of your substrate while providing a new surface functionality.
Newsfeed
ALD NanoSolutions (ALDN) granted
Patent Covering Catalytic Energy
Production Application of Particle ALD™
May 29, 2012 – Full press release
ALD NanoSolutions, Inc. CEO Receives 2012 University of Colorado Distinguished Engineering Alumni Award
April 27, 2012 – Full press release
Naval Air Warfare Center, Weapons Division
Selects ALD NanoSolutions Particle ALD™ System
November 28, 2011 – Full press release
