Patent Portfolio

ALD NanoSolutions is the first company to carry out atomic layer deposition on particle surfaces and on polymer surfaces (also includes non-particle surfaces). Because of this innovation, the U.S. Patent office has allowed broad based process and composition of matter patent claims for ALD on particles, including approximately 100 related claims. ALD NanoSolutions, Inc. has exclusive rights to practice and to license this technology. The most significant process and composition patents are:

Issued Patents

• U.S. Patent No. 60/306,519 entitled -Insulating and Functionalizing Fine Metal Particles With Conformal Ultrathin Films
• U.S. Patent Application No. 60/306,521 entitled – Method for the Deposition of an Inorganic Film on an Organic Polymer Surface Using Atomic Layer Deposition Techniques
• US Pat 6,613,383 – Atomic layer controlled deposition on particle surfaces
• US Pat 6,713,177 – Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films * also filed PCT
• US Pat 6,913,827 – Nanocoated primary particles and method for their manufacture
• US Pat 6,958,174 – Solid material comprising a thin metal film on its surface and methods for producing the same
• US Pat 7,132,697 – Nanomaterials for quantum tunneling varistors
• US Pat 7,396,862 -Dental composite filler particles
• US Pat 7,426,067 – Atomic layer deposition on micro-mechanical devices
• US Pat 7,553,686 – Al2O3 atomic layer deposition to enhance the deposition of hydrophobic or hydrophilic coatings on micro-electromechanical devices

Pending Patents

• 20040194691 – Method of depositing an inorganic film on an organic polymer *also filed PCT
• 20070280895 – Coated particles and sunscreen and cosmetic products containing same
• 20070298250 – Methods for producing coated phosphor and host material particles using atomic layer deposition methods
• Other Molecular Layer Deposition (MLD) provisionals – as yet unpublished