Micro- and nano-electromechanical systems can benefit greatly from atomic layer deposition coatings. The ALD gas-phase process allows film to be uniformly deposited in all gaps and spaces of MEMs devices. This includes gears, actuators, and any unmasked crevice that may be missed with competing line-of-sight deposition technologies. Coatings can be deposited to reduce MEM stiction, increase lifetime and wear resistance, or provide corrosion protection.

ALDN Quad Chart - App - MEMS

Download: ALDN Quad Chart – App – MEMS


ALD NanoSolutions (ALDN) is Granted US Patent For Nanocoatings on Phosphor Particles

January 28, 2014 – Full press release

Founder Prof. Steven George Honored with 2013 ALD Innovation Award

July 29, 2013 - Full press release

ALD NanoSolutions (ALDN) is granted Japanese Patent Covering Protective Coatings for OLEDs

May 2, 2013 - Full press release

ALD NanoSolutions (ALDN) granted
Patent Covering Catalytic Energy
Production Application of Particle ALD™

May 29, 2012 – Full press release

ALD NanoSolutions, Inc. CEO Receives 2012 University of Colorado Distinguished Engineering Alumni Award

April 27, 2012 - Full press release

Naval Air Warfare Center, Weapons Division
Selects ALD NanoSolutions Particle ALD™ System

November 28, 2011 – Full press release