MEMS/NEMS

Micro- and nano-electromechanical systems can benefit greatly from atomic layer deposition coatings. The ALD gas-phase process allows film to be uniformly deposited in all gaps and spaces of MEMs devices. This includes gears, actuators, and any unmasked crevice that may be missed with competing line-of-sight deposition technologies. Coatings can be deposited to reduce MEM stiction, increase lifetime and wear resistance, or provide corrosion protection.

Download: ALDN Quad Chart – App – MEMS