ALD Nanosolutions journal article one of most read in 2014.

Denver, CO – ALD NanoSolutions is proud to announce that our article in JVST-A was one of the most read ALD articles from 2014. The article, Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness, featuring our senior scientist, Dr. Markus Groner, with graduate student Alex Yersak and Professor Y.C. Lee from the University of Colorado – Boulder, discusses the in situ analysis of ALD growth on the first atmospheric pressure spatial ALD web coating reactor. It demonstrates ALD NanoSolutions’ commitment to innovation in roll to roll ALD and process control. Using reflectometry, ALD NanoSolutions and CU-Boulder were able to monitor thin film growth […]

ALD NanoSolutions presents at ALD2015.

PORTLAND, OREGON – (June 29, 2015) – ALD NanoSolutions will be presenting an oral presentation and a poster presentation at the American Vacuum Society ALD 2015 conference. Mr. Joe Spencer is discussing “Atmospheric Pressure Spatial ALD onto Powders with Conventional Powder Handling Equipment” during the Manufacturing session on Wednesday, July 1st at 9:00 AM PT. This talk focuses on our exciting new continuous ALD process and equipment that will revolutionize the Particle ALD market. Also be sure to stop by and talk to Dr. Markus Groner on Monday, June 29th at 5:30 PM PT while he is presenting his poster, “Particle ALD: Hollow Cathode Plasma for Rotary Bed Reactors”. Our […]

ALD NanoSolutions/Meaglow Development Partnership

DENVER, COLORADO — (Marketwired – April 21, 2015) – ALD NanoSolutions and Meaglow are pleased to announce an exclusive partnership for the development and marketing of hollow cathode plasma sources uniquely suited for atomic layer deposition onto particles. An ALD NanoSolutions particle reactor combined with a Meaglow plasma source allows newly developed plasma ALD chemistries to be performed onto particles in appreciable quantities. This expanded capability enables development of new materials and their eventual commercialization. “When you’re coating hundreds of grams of powder, ALD product gases significantly change the gas composition, requiring a robust remote plasma source,” says Joe Spencer, Director of Operations at ALD NanoSolutions. “The Meaglow hollow cathode plasma […]

ALDNanoSolutions, CU-Boulder and CoorsTek awarded $90,000 grant for development of new additive manufacturing precursors.

DENVER, COLORADO — (Feb. 18, 2015) – ALD NanoSolutions continues its long standing relationship with the University of Colorado with a $90,000 grant from the Colorado Office of Economic Development and International Trade. The funding from the Advanced Industry Accelerator grant will develop direct ink writing using particle ALD core-shell precursors for net-shape additive manufacturing of advanced 3-D ceramic structures. Professor Alan Weimer at the University of Colorado is partnering with ALD NanoSolutions and CoorsTek to develop an enabling production process for the next generation of  advanced 3-D ceramics for use in additive manufacturing. The program will use Particle ALDTM to coat sintering additives directly onto fine ceramic particles and optimize the […]

ALD NanoSolutions (ALDN) and the University of Colorado are granted European Patent Covering Atomic Layer Deposition onto Polymers

DENVER, COLORADO — (Sept. 9, 2014) – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Polymer ALD™ technology to develop novel barrier films has exclusively licensed technology from the University of Colorado.  The newly issued European patent expands the proprietary technology to create ultra-thin flexible ultrabarriers and other important surface functionalization on polymers. The newly issued patent is European Patent 1425110 “A Method of Depositing an Inorganic Film on an Organic Polymer”.  The innovation will enable a number of compelling applications including unique formulations for optically clear, flexible, water and oxygen ultrabarrier films and other protective films onto polymers.  The films can be developed for a wide variety of polymers to meet the […]

ALD NanoSolutions Awarded $150,000 DOE SBIR Phase I Grant for Water Desalination

DENVER, COLORADO — (June 25, 2014) – ALD NanoSolutions, Inc. has announced the award of a $150,000 Phase I Small Business Innovation and Research (SBIR) grant from the Department of Energy for “Enhanced Capacitive Deionization using Carbon Electrodes Conformally Coated with Metal Oxides by Atomic Layer Deposition”. The award, effective June 9, 2014 – March 8, 2015, will be used to develop a cost and energy effective method for water desalination. The research, done in partnership with the University of Colorado at Boulder, represents another promising application of ALD coatings for improving energy efficiency. The increasing global need for clean water has spurred the development of multiple desalination techniques, which have traditionally been cost […]

ALD NanoSolutions at TechConnect World 2014

DENVER, COLORADO — (Jun. 14, 2014) –  ALD NanoSolutions is represented at TechConnect World 2014 this year with two oral presentations and two poster presentations. Dr. Karen Buechler will be discussing “Atomic Layer Deposition Innovations in Li-Ion Battery Technology” during the Advanced Batteries session on Tuesday, June 17th at 4:40 ET. This is followed by “Improved Catalysts Prepared using Atomic Layer Deposition Techniques” during the Nanomaterials for Catalysis III session on June 18th at 11:35 ET. The poster presentations are in Advanced Manufacturing on June 16th at 4:30 ET featuring “ALD Tools for Thin-Film Coated Particle Development and Production” and at the Sustainable Nanomanufacturing session on June 16th at 4:30 ET featuring “Roll-to-Roll […]

ALD NanoSolutions (ALDN) is Granted US Patent For Nanocoatings on Phosphor Particles

DENVER, COLORADO — (Jan. 28, 2014) – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Particle ALD™ technology to develop novel nanocoated particles, has received notice of a newly issued atomic layer deposition (ALD) patent from the US PTO. The broad-based patent, developed in collaboration with University of Colorado (Boulder), expands the ALDN proprietary IP portfolio to include protective coatings placed directly on water and oxygen-sensitive phosphor particles used in LED lighting. The newly issued patent is US patent number 8,637,156 “Methods for Producing Coated Phosphors and Host Material Particles Using Atomic Layer Deposition Methods”.   This patent covers both the process and the materials produced by using Particle ALD™ methods to protect […]

ALD NanoSolutions’ Founder Prof. Steven George Honored with 2013 ALD Innovation Award by the American Vacuum Society

DENVER, COLORADO — (Jul. 29, 2013) – ALD NanoSolutions is pleased to announce that the American Vacuum Society has awarded Professor and Co-Founder Steven George the 2013 ALD Innovation Award at the annual topical conference on Atomic Layer Deposition (ALD).  This award is given to an individual who has made significant achievements in the field of ALD.  Dr. George is an innovator who has been on the cutting edge of transitioning the fundamentals of atomic layer deposition to commercial applications for more than 10 years.  He currently works in diverse areas including electric power storage and generation as well as transparent flexible ultra-barrier films. About ALD NanoSolutions ALD NanoSolutions (ALDN) is dedicated to […]

ALD NanoSolutions (ALDN) is granted Japanese Patent Covering Protective Coatings for OLEDs

DENVER, COLORADO — (May 2, 2013) – ALD NanoSolutions (ALDN), a nanomaterials development company using the platform Polymer ALD™ technology to develop novel barrier films, has exclusively licensed recently-developed atomic layer deposition (ALD) and molecular layer deposition (MLD) technology from the University of Colorado (Boulder).  The newly issued Japanese patent expands the ALDN proprietary IP portfolio to include ultra-thin flexible ultrabarriers created by an ALD/MLD process.  These flexible multilayer barrier solutions have been referenced in multiple FOLED market studies as being critical for the implementation of flexible OLED displays. The newly issued patent is Japanese Patent Number 5220106 “Protective Coatings for Organic Electronic Devices Made Using Atomic Layer Deposition and Molecular Layer Deposit […]